- It's environmentally clean.
- You can easily comply with regulation requirements; it is a very effective long-term solution.
- It is fast.
- It is very cost-effective.
- You have the ability to selectively remove the coating from a specific targeted area.
- Specialized abrasive material such as Carbo Blast TM doesn't damage the surrounding components or board
How does it work?
- In the micro-abrasive blasting process, a precise mixture of dry air or gas and a abrasive media is propelled through a tiny nozzle attached to a stylus, which is either handheld or mounted on an automated system. The mixture is pointed to the precise area of conformal coating to be removed. A vacuum system continuosly removes the used materials and channels them through a filtration system for disposal.
- The Ionized Work Chamber and Point Ionizer TM is used to control levels of electrostatic discharge (ESD), preventing a buildup of static electricity. It also contains the spent abrasive material.
- Crystal Mark has technology that has helped many companies with conformal coating removal. We have products and ideas that work for your use cases. We customize the solution to fit your specific application.
- Call us today, and find out more about conformal coating removal technology.
- The quality of wafers is extremely important for effective fabrication of electronic circuits.
The Micro abrasive blasting can help in two important ways:
1. Surface Finishing: The SWAM Abrading System by Crystal Mark finishes the surfaces consistently with required precision.
Advantages of micro abrasive blasting:
a. Remove oxides and junctions.
b. Eliminates the backside damage for gettering, mesa diode processing as well as for
backlapping.
c. Reliable cleaning.
This technology can also be used for surface finishing, surface texturing as well as surface preparation for a variety of different applications.
2. Wafer coring and contouring: Crystal Mark's SWAM C-5100 replaces all grinding operations with one numerical, computer controlled, micro abrasive nozzle positioning system. The micro abrasive blasting re-sizes the wafers without creating excessive heating. Also, there is minimal effect from shock to the wafer. It is designed for Cutting and Edge Rounding of silicon, silicon carbide, sapphire, Geranium, NaG, GaAs, and other III-V materials as well as for Epi Crown Removal.
Advantages of our technology:
a. Precise work with guaranteed flat and/or notch in equivalent positions, This helps in keeping the alignment of silicon grains.
b. Smooth edges that help in preserving the wafers. Sharp edges from other methods can cause wafers to crack.
c. No crowning of wafer edges that limits effectiveness of wafer lines.
d. Protection from electrostatic discharge preserves the circuits/components built in the silicon of the wafers.
e. Achieve dimensional tolerances up to +/- .002".
f. Complete automatino and control that simplifies the wafer assembly lines.